AC450#08 for metals

Sputtering of metals:
– Cr (Chromium) – up to 500 nm (~ 4 Å/s)
– Mo (Molybdenum) – up to 500 nm (~8 Å/s)
– W (Tungsten) – up to 500 nm (~ 5 Å/s)
– NiCr 50/50 (NickelChromium)

On request:
– B (Boron)
– Ni (Nickel)
– Co (Cobalt) – up to 500 nm (~ 4 Å/s)

Samplesize: Small samples up to 4 inch wafer, maximum thickness ~ 10 mm.