AC450#09 for superconductors

(Reactive) Sputtering of superconducting metals and nitrides:
– Ti (Titanium) – up to 2000 nm (~7 Å/s)
– TiN (Titanium Nitride) – up to 2000 nm (~ Å/s)
– Al (Aluminium) – up to 3000 nm (~6 Å/s)
– MoRe (Molybdenum-Rhenium) – up to 500 nm (~ Å/s)
– NbTiN (Niobium-Titanium Nitride) – up to 2000 nm (~ Å/s)

On request:
– AlSi (AluminiumSilicon 99/1) – up to 2000 nm (~6 Å/s)
– Nb (Niobium) – up to 2000 nm (~5 Å/s)
– Ta (Tantalum) – up to 2000 nm (~ Å/s)

Samplesize: Small samples up to 4 inch wafer, maximum thickness ~ 2 mm.