PAS5500 /1100B ArF (193 nm) Scanner
Configured for 100mm wafers (4 inch)
Resolution: 100 nm
Single Machine Overlay accuracy: 15 nm
Interfaced with DUV Track
Standard DUV Stack: ~38 nm BARC / ~225 nm Resist / ~90 nm TARC
MESA+ Institute
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Enschede, The Netherlands
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