Mainly used for etching of InP, InGaAs, InGaAsP and Cr.
We do not offer etching of Si on this system.
Supported substrate sizes:
1. Piece parts of up to 2 inch,
2. Single full wafers: 2, 3 and 100mm (4-inch).
MESA+ Institute
Hallenweg 15, 7522 NH
Enschede, The Netherlands
Corporate business typically refers to large-scale mansola it.
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