
The system employs two magnetron targets, argon discharge plasma, giving a fine-grain, cool sputtering of thin metal films.
– Leica EM ACE600 Double sputter coater
– turbo molecular pumped (10^-5 to 10^-7 mbar)
– motorized stage for even distribution of coating material
– 2 sputter targets
– shutter assembly
– film thickness monitor
– glow discharge pre clean target materials or activate the sample surface
– available materials: Ag, Al, Au, Au/Pd, C, Cr, Cu, Ge, Ni, Pd, Si, Ti, W
– sample-size: up to 100 mm wafer
MESA+ Institute
Hallenweg 15, 7522 NH
Enschede, The Netherlands
Corporate business typically refers to large-scale mansola it.
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