Nanoscribe 3D laser lithography
– Nanoscribe 3D laser lithography
– Voxel size; x-y ~300 nm z~1000 nm
– Positioning accuracy <1 nm
– Repeat accuracy 5 nm
– Writing volume 300 x 300 x 100 mu
– Laser center wavelength 780 nm
– Applicable photoresist; SU-8, IP-L, IP-G, AZ 9260
MESA+ Institute
Hallenweg 15, 7522 NH
Enschede, The Netherlands
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