PVD cluster with Load Lock and 2 deposition chambers
Metal Chamber, DC sputtering, 5 targets, available: W, Ti, Mo, Au,
Dielectric Chamber, RF and pulsed DC sputtering, available: ITO, Si3N4, SiO2, TiO2, Al2O3, HfO2, substrate heating max 1000C
Only a selection of the targets are built in.
MESA+ Institute
Hallenweg 15, 7522 NH
Enschede, The Netherlands
Corporate business typically refers to large-scale mansola it.
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