High-temperature atmospheric furnace for furnace-compatible processing (MFP). Use this furnace for:
• densification of PECVD SiO2 (Micronit GmbH)
• annealing of polySi
• annealing of SiRN(G4)
The following annealing process is only assigned to metal capping on Mo and Ta2O5/Pt/Ta2O5 electrodes
MESA+ Institute
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Enschede, The Netherlands
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