Tempress Systems Omega Jr | B1 – Silicidation and annealing

High-temperature furnace for in-line compatible processing (ILP).
Temperature range: 400°C – 1100°C.
Annealing & Oxidation of: silicon, ‘safe’ metals. Use this furnace for:

• formation of metal silicides (PtSi, TiSi, CoSi, MoSi) on silicon substrates
• annealing of ZrO2 or TiO2 in artificial air
• Annealing of bare sapphire