
High-temperature atmospheric furnace for dry-oxidation and annealing. Temperature range: 400°C – 1100°C. Substrates processed in this furnace may, under special conditions, be allowed in other furnace systems.
Use this furnace for:
• Ta or Ti oxidation
• densification of PECVD layers (Oxford 133)
• bonding with of doped layers
• annealing of Al layers with H2O
MESA+ Institute
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Enschede, The Netherlands
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