Tempress Systems Omega Jr | B3 – Annealing

High-temperature furnace for in-line compatible processing (ILP).
Annealing & Activation of: metal oxides, ALD-oxides, PLD-materials. Materials/substrates processed in this furnace cannot go into any other furnace system!

Use this furnace for:

• glass-silicon bonding
• densification of PECVD layers (Oxford 80)
• oxidation of tantalum (Ta)
• annealing of PECVD SiON (Oxford 80)
• annealing of Al2O3 (rare earth doping)
• annealing of metal stacks on silicon or glass
• oxidation of porous silicon and silicon carbide