Voyager

Raith Voyager lithography system

– Sample loadlock
– Universal sample holder for small sample pieces up to 100mm 10mm max height
– Electron beam energy 10 – 50kV
– Beam current range 50 pA – 40 nA
– Beam size < 2.5 nm diameter at 50 kV
– Beam current stability <0.5% / h
– Beam position stability < 200 nm / 8h
– Patterning area 150mm by 150mm symmetrical
– Pattern generator 50 MHz pixel frequency
– 20 ns minimum dwell time
– Stage range x=150 by y=150mm z=20 mm
– Laser-interferometer X –Y stage with 1 nm position resolution
– Z – axis Laser Height sensing reproducibility 1 micron
– Write field stitching 35 nm in 500 micron write field
– Minimum feature size 20 nm in high resolution positive resist
– Mark recognition gives overlay accuracy of 35 nm
– GDSII format viewer and editor
– Import AutoCAD DXF,bitmap, ASCII or CIF format converted to GDSII
– Traxx and Periodixx software option
– FBMS and MBMS software option