Geplaatst: 14 maart 2026

Geplaatst:

E-beam evaporation of metals;
Argon Ion milling in evaporation chamber.

Sample size: small samples up to multiple 4 inch wafers (13)
Thickness limitation: 20 nm except for Au and Al (exceptions can be granted, but only if you stop by)

Geplaatst:

(Reactive) Sputtering of superconducting materials
-Ti (Titanium) – up to 100 nm (~1 Å/s) (confocal)
-Nb (Niobium) – up to 200 nm (~2 Å/s) (confocal)
-Ta (Tantalum) – up to 200 nm (~1.5 Å/s) (confocal)
-NbTiN (Niobium Titanium Nitride) – up to 300 nm (~4 Å/s) using Alloy target

-TiN (Titanium Nitride) – up to 200 nm (~_ Å/s) (confocal)
-NbN (Niobium Nitride)- up to 200 nm (~_ Å/s) (confocal)
-NbTiN (Niobium Titanium Nitride) – up to 200 nm (~ _ Å/s) using confocal co-sputtering

Substrate heating during deposition possible. (RT -> 750 C)
Possibility of RF sample bias.

Samplesize: Small samples up to 4 inch wafer, maximum thickness ~ 1 mm.

Geplaatst:

Fluorine based RIE system

Geplaatst:

All users please notice this: SF6 processes only on F1 tool.
(Fluoro-Carbon related processed disabled)