Recently new equipment has been installed in NanoLab at TUe to support our customers in the field of Integrated Photonics. These new tools enable improved processing of III-V semiconductors photonic materials in terms of thickness, defectivity, and composition control yielding better wafer uniformity and run-to-run reproducibility.
Metal Organic Vapor Phase Epitaxy
The key enabling tool in this program is a new MOVPE (Metal Organic Vapor Phase Epitaxy) machine, the Aixtron Next Gen 2800G4 12*4 inch. This planet wafer reactor is a first of its kind including all latest technological developments. It is a result of a unique cooperation between TU Eindhoven and Aixtron in the Interreg OIP4NWE program.
Metal Organic Vapor Phase Epitaxy machine, the Aixtron Next Gen 2800G4 12*4 inch
To be able to characterize the resulting MOVPE films some of our analysis tools have been renewed. A Photo Luminescence (PL) Mapper is purchased from Onto Innovation to measure spectra of the emitted light and thus revealing the band gap of the semiconductor material. A new Bruker X-Ray Diffraction (XRD) tool is installed for measuring the crystal properties of the epitaxial III-V films, like lattice constants and strain. Both machines can be upgrade for cassette to cassette loading of 4 inch wafer in the future, if needed. The purchase of these tools is part of the Interreg Pilootlijnen project.
New equipment NanoLab TUe